Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
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Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.
Imprint | Springer-Verlag |
Country of origin | Germany |
Series | Springer Series in Materials Science, 72 |
Release date | May 2004 |
Availability | Expected to ship within 10 - 15 working days |
First published | 2004 |
Editors | Jarek Dabrowski, Eicke R. Weber |
Dimensions | 235 x 155 x 38mm (L x W x T) |
Format | Hardcover |
Pages | 490 |
Edition | 2004 ed. |
ISBN-13 | 978-3-540-20481-7 |
Barcode | 9783540204817 |
Categories | |
LSN | 3-540-20481-4 |